Paper Title:
Microstructure, Hardness and Oxidation Resistance of CrN and CrAlN Coatings Synthesized by Multi-Arc Ion Plating Technology
  Abstract

Approximately 2 μm thick CrN and CrAlN coatings were synthesized on silicon and spring steel substrate by multi-arc ion plating technology. The nanoindentation techniques, Auger electron spectroscopy (AES) analysis, scanning electron microscopy, X-ray diffraction and oxidation furnace were used to investigate the mechanical property, oxidation resistance and microstructure of the coatings. The XRD data showed that the CrN and CrAlN coatings exhibited B1 NaCl structure. Nanoindentation measurements showed that as-deposited CrN and CrAlN coatings exhibited a hardness of 19 and 30 GPa respectively. Compared with CrN coatings, the CrAlN composite coatings show much better oxidation resistance. And the oxidation resistance ability will enhance with increasing Al content, because A12O3 will form after oxidation in high temperature condition which could reduce the diffusivity ability of oxygen.

  Info
Periodical
Advanced Materials Research (Volumes 168-170)
Edited by
Lijuan Li
Pages
2430-2433
DOI
10.4028/www.scientific.net/AMR.168-170.2430
Citation
Z. H. Cai, Z. Ping, Y. L. Di, "Microstructure, Hardness and Oxidation Resistance of CrN and CrAlN Coatings Synthesized by Multi-Arc Ion Plating Technology", Advanced Materials Research, Vols. 168-170, pp. 2430-2433, 2011
Online since
December 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Ri Sheng Du, Ji Hua Peng, Xian Wen Liang, Jun Tian
Abstract:In this paper, the TiN/TiAlN duplex coatings were deposited on SKH51 tool steel by means of multi-arc ion plating. By means of SEM, Vickers...
402
Authors: Lin Yung Tseng, Jhewn Kuang Chen, Kai Hung Hsu, Wan Yu Wu, Chi Lung Chang
Chapter 2: Material Processing Technology, Technologies of Application of Materials
Abstract:Nanocomposite Cr-W-B-N coatings with various tungsten contents were synthesized on silicon wafer substrates. The used technique is a DC...
430
Authors: Adisorn Buranawong, Nirun Witit-Anun
Chapter 2: Nanomaterials, Chemistry and Biochemistry of Materials, Chemical Technologies
Abstract:The CrN thin films were deposited on silicon (100) substrate using reactive magnetron sputtering technique. The films were characterized by...
57