Paper Title:
Study of Contact Temperature in Polishing Surfaces
  Abstract

Based on a three-body micro-contact mechanism and contact temperature theory, a micro-contact temperature model was developed to investigate the effect of particle size, particle density, and rotational speed on temperature rise between particles and workpieces. The experiments with different particle sizes and rotational speeds verified the feasibility of the micro-contact temperature analysis. The results indicate that contact temperature between particles and workpieces linear increases as particle size and rotational speed increase. The particle density has a negligible effect on maximum contact temperature between particles and workpieces.

  Info
Periodical
Advanced Materials Research (Volumes 189-193)
Edited by
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Pages
1527-1531
DOI
10.4028/www.scientific.net/AMR.189-193.1527
Citation
J. H. Horng, Y. Y. Chen, H. W. Wu, C. C. Wei, S. Y. Chern, "Study of Contact Temperature in Polishing Surfaces", Advanced Materials Research, Vols. 189-193, pp. 1527-1531, 2011
Online since
February 2011
Export
Price
$35.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Takeshi Tanaka
Abstract:In this study, we proposed ER fluid-aided polisher (ERAP) using one-sided, patterned electrodes. The characteristics of ER fluid and ER...
201
Authors: Suo Xian Yuan, Yun Xia Hao
Abstract:In recent years, the demands on product performance are improving, particularly in the aviation; electronics, precision instruments and other...
713
Authors: Ya Dong Gong, Yue Ming Liu, Jun Cheng, J.F. Zhang
Abstract:Grinding characteristics brought by the grinding speed reduction and geometrical model differences between micro-grinding and conventional...
6
Authors: Mahadev Gouda Patil, Kamlesh Chandra, Prabhu Shankar Misra
Chapter 5: Powder Metallurgy and Plastic Deformation
Abstract:Abstract: The magnetic abrasive finishing (MAF) process which was introduced during the late 1940s has emerged as an important...
1577
Authors: Jian Xiu Su, Jia Xi Du, Xing Long Liu, Hai Na Liu
Abstract:SiC crystal substrate has been widely used in the area of microelectronics, photonics and new materials, such as semiconductor lighting,...
250