Paper Title:
Polyhedral Oligomeric Silsesquioxane/PDMS Hybrid Coating Protecting Polyimide from Atomic Oxygen Erosion
  Abstract

Hybrid inorganic/organic polymers have been prepared by copolymerizing a silanol terminated polydimethylsiloxane (PDMS) with an Octa(aminophenyl) -silsesquioxane (POSS). The AO resistance of these POSS/PDMS hybrid films was tested in the ground-based AO simulation facility. Exposed and unexposed surfaces have been characterized by X-ray photoelectron spectroscopy. The XPS data indicate that the carbon content of the near-surface region is decreased from 65.3 to 18.9 at% after AO exposure. The oxygen and silicon concentrations in the near-surface region increase after AO exposure. The data reveal the formation of a passive inorganic SiO2 layer on the POSS/PDMS hybrid films during the AO exposure, which serves as a protective barrier preventing further degradation of the underlying polymer with increased exposure to the AO flux. The erosion yield of the POSS/PDMS (20 wt%) hybrid film was 1.7×10-26 cm3/atom, decreased by two orders of magnitude compared with the value of 3.0×10-24 cm3/atom of the polyimide film.

  Info
Periodical
Advanced Materials Research (Volumes 189-193)
Edited by
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Pages
336-339
DOI
10.4028/www.scientific.net/AMR.189-193.336
Citation
S. W. Duo, M. M. Song, T. Z. Li, Y. Luo, M. S. Li, "Polyhedral Oligomeric Silsesquioxane/PDMS Hybrid Coating Protecting Polyimide from Atomic Oxygen Erosion", Advanced Materials Research, Vols. 189-193, pp. 336-339, 2011
Online since
February 2011
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$32.00
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