Paper Title:
The Structure and Electrochemical Properties of BDD Deposited on Ti Substrate by MWCVD
  Abstract

In this paper, Boron doped diamond (BDD) thin films have been deposited on Ti substrates by microwave plasma chemical vapour deposition (MWCVD). Raman spectroscopy scanning electron microscopy (SEM) and X-ray diffraction (XRD) examinations demonstrate that the electrode has well-defined diamond features. It is observed that the BDD electrode has a high overpotential 2.5V for water electrolysis prohibiting the evolution of oxygen in the cyclic voltammetry test. Further more,the removal efficiency of chemical oxygen demand (COD) is evaluated by the electrochemical oxidation of wastewater containing phenol.

  Info
Periodical
Advanced Materials Research (Volumes 189-193)
Edited by
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Pages
4267-4270
DOI
10.4028/www.scientific.net/AMR.189-193.4267
Citation
F. Liu, W. J. Wang, J. T. Wang, L. W. Xiong, Y. L. Xin, X. B. Li, "The Structure and Electrochemical Properties of BDD Deposited on Ti Substrate by MWCVD", Advanced Materials Research, Vols. 189-193, pp. 4267-4270, 2011
Online since
February 2011
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$32.00
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