Paper Title:
Chemical Vapor Deposition (CVD) of ZrC Coatings from ZrCl4-C3H6-H2
  Abstract

ZrC coatings were prepared by CVD using ZrCl4, C3H6, and H2 as the precursors. The mechanisms responsible for the effects of deposition temperature, H2 flow rate and inlet C/Zr ratio on the ZrC coatings were studied based on the deposition mechanism of ZrC. The results indicate that the ZrC morphologies change from a loose spherical structure to a cauliflower structure, then to a glassy structure as the deposition temperature increases from 1050°C to 1150°C, then to 1250°C. The carbon content in the ZrC coatings increases with increasing the deposition temperature. Higher inlet C/Zr ratio can lead to rough surfaces and higher carbon content. Reasonable H2 concentration can inhibit carbon deposition, and lead to a cauliflower structure.

  Info
Periodical
Advanced Materials Research (Volumes 189-193)
Edited by
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Pages
648-652
DOI
10.4028/www.scientific.net/AMR.189-193.648
Citation
Q. M. Liu, L. T. Zhang, Z. X. Meng, L. F. Cheng, "Chemical Vapor Deposition (CVD) of ZrC Coatings from ZrCl4-C3H6-H2", Advanced Materials Research, Vols. 189-193, pp. 648-652, 2011
Online since
February 2011
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Price
$32.00
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