Paper Title:
CrN Films Deposited by Middle Frequency Magnetron Sputtering
  Abstract

CrN films with deposition rates of 30-190 nm/min were deposited on Si (111) substrates by middle-frequency magnetron sputtering methods. XRD, SEM, EDS and microhardness tests were used to investigate the effects of bias voltages and total gas pressure on the structure and mechanical properties of the resulting CrN films. With the increasing of bias voltages and total gas pressure, the preferential diffraction orientation changed from (111) to (200). A smooth surface was observed by the SEM experiments and the thickness of the film was about 2 µm. The deposition rates and Cr content of resulting films were highly influenced by the magnitude of the bias voltage and total gas pressure. RMS and Ra properties of the CrN films increased when increased total gas pressure or decreased bias voltage. CrN films produced under optimal conditions have an almost 1:1 Cr:N ratio as determined by EDS. The hardness of the CrN film increased from 2200 to 2700 HV when increased the bias voltages from 0 to 200 V.

  Info
Periodical
Advanced Materials Research (Volumes 189-193)
Edited by
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Pages
901-905
DOI
10.4028/www.scientific.net/AMR.189-193.901
Citation
C. W. Zou, J. Zhang, W. Xie, L. X. Shao, "CrN Films Deposited by Middle Frequency Magnetron Sputtering", Advanced Materials Research, Vols. 189-193, pp. 901-905, 2011
Online since
February 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Shu Yong Tan, Xu Hai Zhang, Xiang Jun Wu, Feng Fang
Abstract:CrNx films were synthesized under graded/constant bias by DC magnetron sputtering. In the present work, the graded bias deposited CrNx films...
1476
Authors: Ming Sheng Li, Yong Zhong Fan, Shu Juan Zhang, Chang Jie Feng
Abstract:Recently, Cr-Al-N coatings have received more and more attention of researchers owing to its standing-out mechanical performances and...
668
Authors: Adisorn Buranawong, Nirun Witit-Anun
Chapter 2: Nanomaterials, Chemistry and Biochemistry of Materials, Chemical Technologies
Abstract:The CrN thin films were deposited on silicon (100) substrate using reactive magnetron sputtering technique. The films were characterized by...
57