Paper Title:
Study on Low Temperature Deposition of TiN Films and their Tribological Properties
  Abstract

The low temperature deposition principle of magnetron sputtering was discussed. Reactive magnetron sputtering technique was used to gain titanium nitride (TiN) thin films on W18Cr4V high-speed steel substrates at low temperature. A series of experiments had been conducted to study the properties of TiN films. The experimental results showed that at the low temperature(<140 °C), magnetic sputtering can be used for the deposition of TiN film with compact, uniform and high nano-hardness, and their tribological properties were excellent, which co-determined by the film structure of low temperature magnetron sputtering and the counter-parts of rubbing pairs.

  Info
Periodical
Advanced Materials Research (Volumes 189-193)
Edited by
Zhengyi Jiang, Shanqing Li, Jianmin Zeng, Xiaoping Liao and Daoguo Yang
Pages
925-930
DOI
10.4028/www.scientific.net/AMR.189-193.925
Citation
X. Q. Bai, J. Li, "Study on Low Temperature Deposition of TiN Films and their Tribological Properties", Advanced Materials Research, Vols. 189-193, pp. 925-930, 2011
Online since
February 2011
Authors
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Price
$32.00
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