Paper Title:
Electrical and Optical Properties of Indium and Aluminium Doped Zinc Oxide Films Prepared by RF Magnetron Sputtering
  Abstract

ZnO: In (IZO, 10wt % In2O3) and ZnO: Al (AZO, 1wt % Al2O3) films were deposited on Corning glass substrates by RF magnetron sputtering. The samples were either prepared on unheated substrates and post annealed in N2 at different temperatures, or prepared at elevated temperatures. Electrical, optical and structural properties were investigated as a function of deposition temperature and annealing temperature. Increasing the substrate heater temperature would lead to a decline in the electrical conductivity of IZO films, while AZO films showed unchanged performance in the substrate heater temperature range of 150 - 300°C. Post annealing appears to be an effective way to improve the electrical properties of both IZO and AZO films without sacrificing transparency. In this work, AZO films have higher conductivity and light transmission than IZO films.

  Info
Periodical
Advanced Materials Research (Volumes 194-196)
Edited by
Jianmin Zeng, Taosen Li, Shaojian Ma, Zhengyi Jiang and Daoguo Yang
Pages
2272-2275
DOI
10.4028/www.scientific.net/AMR.194-196.2272
Citation
L. T. Yan, J. Rath, R. Schropp, "Electrical and Optical Properties of Indium and Aluminium Doped Zinc Oxide Films Prepared by RF Magnetron Sputtering", Advanced Materials Research, Vols. 194-196, pp. 2272-2275, 2011
Online since
February 2011
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$32.00
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