Paper Title:
Models and Simulations of the UV Lithography Process Based on Thick Photoresists
  Abstract

This paper presents the models for the ultraviolet (UV) lithography of thick photoresists such as thick SU-8. Simulations for various lithography conditions have been conducted using these models based on the improved dynamical cellular automata method. Some experiments on SU-8 2075 layers under UV source with 365nm wavelength have been implemented to verify the simulation results. The results confirm the validity of the proposed models.

  Info
Periodical
Advanced Materials Research (Volumes 201-203)
Edited by
Daoguo Yang, Tianlong Gu, Huaiying Zhou, Jianmin Zeng and Zhengyi Jiang
Pages
75-79
DOI
10.4028/www.scientific.net/AMR.201-203.75
Citation
Z. F. Zhou, Q. G. Huang, W. H. Li, "Models and Simulations of the UV Lithography Process Based on Thick Photoresists", Advanced Materials Research, Vols. 201-203, pp. 75-79, 2011
Online since
February 2011
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$32.00
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