Paper Title:
Realization of Three-Dimensional Nanostructure Fabrication by Nanoimprint on Silicon Substrate
  Abstract

Traditional optical lithography techniques to fabricate three-dimensional (3D) nanostructures are complicated and time consuming. Due to the capability to replicate nanostructures repeatedly in a large area with high resolution and uniformity, nanoimprint (NI) has been recognized as one of the promising approaches to fabricate 3-D nanostructures with high throughput and low cost. This paper introduces a novel 3-D nanostructure fabrication method by nanoimprint on silicon substrate. Nanoscale gratings and microlens array are taken as examples of 3-D nanostructures fabricated by nanoimprint. High fidelity demonstrates the possibility of nanoimprint to fabricate 3-D nanostructures on silicon substrate.

  Info
Periodical
Advanced Materials Research (Volumes 211-212)
Edited by
Ran Chen
Pages
1105-1109
DOI
10.4028/www.scientific.net/AMR.211-212.1105
Citation
X. Q. Fan, "Realization of Three-Dimensional Nanostructure Fabrication by Nanoimprint on Silicon Substrate", Advanced Materials Research, Vols. 211-212, pp. 1105-1109, 2011
Online since
February 2011
Authors
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