Experimental Study on the Precision Lapping of Sapphire Substrate
| Periodical | Advanced Materials Research (Volume 215) |
|---|---|
| Main Theme | Digital Design and Manufacturing Technology II |
| Edited by | Congda Lu |
| Pages | 291-294 |
| DOI | 10.4028/www.scientific.net/AMR.215.291 |
| Citation | Xiao Wang et al., 2011, Advanced Materials Research, 215, 291 |
| Online since | March, 2011 |
| Authors | Xiao Wang, Cong Da Lu, Dong Hui Wen |
| Keywords | Experimental Study, Precise Lapping, Roughness, Sapphire |
| Price | US$ 28,- |
Experimental research on the surface quality parameters such as roughness and removal rate in the precision lapping of sapphire was promoted in this paper, effects of processing parameters as load, speed of rotation, grain size and density on sapphire surface quality was studied by experiments. Results showed that lapping load and rotate speed were the most important factors on the removal rate, grain size played a key role in the removal rate and roughness under the same conditions, profile tolerance of surface shape depends on the flatness.