Paper Title:
Deposition of TiO2 Thin Films Using Magnetron Sputtering
  Abstract

TiO2 with 20nm in diameter have been prepared by using magnetron sputtering technique. The structure of these powers was determined by X-ray diffraction experiments. The average grain size and particle size in these powers were measured by the line profile analysis method of X-ray diffraction patterns and by scan electron microscopy, respectively. The thin films were investigated by using XRD, SEM measurements.

  Info
Periodical
Advanced Materials Research (Volumes 217-218)
Edited by
Zhou Mark
Pages
1743-1746
DOI
10.4028/www.scientific.net/AMR.217-218.1743
Citation
X. L. Guo, "Deposition of TiO2 Thin Films Using Magnetron Sputtering", Advanced Materials Research, Vols. 217-218, pp. 1743-1746, 2011
Online since
March 2011
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