In an End-Hall source an ion-beam is extracted from a magnetized plasma and accelerated by the plasma electric field without grids. The ion beam of End-Hall sources is not space charge limited and ion current as large as 5 A at relatively low energy (100 V) can be achieved. These properties are very interesting for surface processing applications and thin film technology. Although End-Hall sources are commonly used for these applications, the physics of these sources is only poorly understood and a quantitative and predictive model of their regime of operation is still missing. The two-dimensional self-consistent model of Hall effect thrusters described in Ref.  has been adapted to End Hall sources and is used in this paper to describe the principles and main characteristics of these sources.