Paper Title:
Investigation on Thin Films Deposited by PECVD from a DiPhenylMethylSilane (DPMS) Vapors or Mixed with Oxygen for Low-K Material Application
  Abstract

A new class of low-k materials thin films, deposited from a DiPhenyleMethylSilane (DPMS) vapors was prepared using PECVD technique. These films are elaborated in microwave excited DECR plasma reactor (Distributed Electron Cyclotron Resonance) from pure DiPhenylMethylSilane (DPMS) using various plasma discharge power (100-400 W) or mixed with 50% of oxygen (O2).The improvements of film properties were investigated by capacitance–frequency (C–f), current–voltage (I–V) techniques and Fourier transform infrared spectroscopy (FTIR). The obtained results show that an increase in plasma discharges power from 100 to 400 watts leads to the decrease in dielectric constant value from 4.4 to 3.7 (measured at 10 kHz). The incorporation of oxygen improves the dielectric properties of the films; the dielectric constant value was reduced to 2.9.

  Info
Periodical
Edited by
El-Hachemi Amara and Djamila Bennaceur-Doumaz
Pages
35-38
DOI
10.4028/www.scientific.net/AMR.227.35
Citation
L. Bouledjnib, S. Sahli, A. Zenasni, P. Raynaud, Y. Segui, "Investigation on Thin Films Deposited by PECVD from a DiPhenylMethylSilane (DPMS) Vapors or Mixed with Oxygen for Low-K Material Application", Advanced Materials Research, Vol. 227, pp. 35-38, 2011
Online since
April 2011
Keywords
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: M. Carmo Lança, C.J. Dias, D.K. Das Gupta, José N. Marat-Mendes
396
Authors: Athipong Ngamjarurojana, Supon Ananta, Rattikorn Yimnirun
Abstract:The structure and electrical properties of Al2O3-doped 0.2Pb(Zn1/3Nb2/3)O3-0.8Pb(Zr1/2Ti1/2)O3 ceramic, which is the morphotropic phase...
89
Authors: Uraiwan Intatha, Sukum Eitssayeam, Kamonpan Pengpat, Gobwute Rujijanagul, Tawee Tunkasiri
Abstract:In this work, preparation conditions and effect of ZrO2 doped BaFe0.5Nb0.5O3 ceramics were studied. Relationship between structure and...
889
Authors: Zhi Li Zhang, Chun Xu, Qiu Ping Liu
Abstract:In the search of more microwave dielectric materials with high-quality factor (Qf ) and high relative dielectric constant (r), RENbO4...
217
Authors: E. de Carvalho, Marcelo Bertolete, Izabel Fernanda Machado, E.N.S. Muccillo
Chapter 3: Ceramics II
Abstract:Polycrystalline CaCu3Ti4O12 ceramics were prepared by solid state reactions by spark plasma sintering (SPS)...
982