Paper Title:
Research on the Preparation Methods of Silicon Oxide Thin Films
  Abstract

Silicon oxide thin films have many excellent properties such as hardness, optical,dielectric properties,wear-resistance and corrosion-resistance. It has been widely used in optical and microelectronic applications. The preparation methods mainly include phsical vapor deposition and chemical vapor deposition.The paper reviews a few preparation methods of silicon oxide thin films, and compares advantages and disadvantages w ith each other. On the other hand,it point out the tendency of development.

  Info
Periodical
Advanced Materials Research (Volumes 233-235)
Edited by
Zhong Cao, Lixian Sun, Xueqiang Cao, Yinghe He
Pages
2556-2560
DOI
10.4028/www.scientific.net/AMR.233-235.2556
Citation
C. W. Li, Q. L. Zhang, S. Y. Xu, G. Y. Wang, "Research on the Preparation Methods of Silicon Oxide Thin Films", Advanced Materials Research, Vols. 233-235, pp. 2556-2560, 2011
Online since
May 2011
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Price
$32.00
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