Paper Title:
Effect of Thickness on GLAD TiO2 Thin Films with Incline Spinning Substrate on Rotating Holder (ISSRH) Technique
  Abstract

The report presents the effects of the thickness on the TiO2 thin films prepared by the GLAD technique with incline spinning substrate on rotating holder (ISSRH) by using the electron beam evaporation. The prepared films were heated at 500 °C for 2 hr in air. The microstructure of films was investigated by UV- visible photometer, X-ray diffraction, XRD and field emission scanning electron microscope, FE-SEM. The results showed the thickness of 10, 50, 100 and 300 nm films exhibited continuity distribution of the crystalline. The crystalline structure evidenced the dominant peak at the 300 nm thickness. GLAD TiO2 films exhibited the columnar growth and porosity. The TiO2 nanostructures showed rutile phase.

  Info
Periodical
Advanced Materials Research (Volumes 236-238)
Edited by
Zhong Cao, Yinghe He, Lixian Sun and Xueqiang Cao
Pages
3024-3027
DOI
10.4028/www.scientific.net/AMR.236-238.3024
Citation
V. Mekla, S. Pukird, S. Porntheerapat, J. Nukeaw, "Effect of Thickness on GLAD TiO2 Thin Films with Incline Spinning Substrate on Rotating Holder (ISSRH) Technique", Advanced Materials Research, Vols. 236-238, pp. 3024-3027, 2011
Online since
May 2011
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$32.00
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