Paper Title:
The Stability of a-Si:H Thin Films in Different Environment
  Abstract

Hydrogenated amorphous silicon (a-Si:H) films were deposited on glass substrates with silane (SiH4) gas and hydrogen using RF-PECVD method at different power. The phase structure of the films was measured with Raman spectrometer and Panalytical X'Pert PRO X-ray diffraction (XRD), respectively. The optical properties and surface morphology of the films were measured using Shimadzu UV-3600 spectrophotometer and optical digital microscope, respectively. The effects of the environment, including salt water, tap water, acid solution and temperature, on the stability of the films were investigated. The results showed that the phase structures of the films were amorphous, the films can be eroded under salt water and tap water environment, the corrosion resistant stability was improved with increasing the power, the films under acid solution environment appear good corrosion resistant properties, the influence of the environment temperature on the film properties is little. The results had been discussed.

  Info
Periodical
Advanced Materials Research (Volumes 239-242)
Edited by
Zhong Cao, Xueqiang Cao, Lixian Sun, Yinghe He
Pages
1428-1432
DOI
10.4028/www.scientific.net/AMR.239-242.1428
Citation
P. L. Yang, Q. N. Zhao, Y. Liu, W. H. Yuan, W. Y. Wang, "The Stability of a-Si:H Thin Films in Different Environment", Advanced Materials Research, Vols. 239-242, pp. 1428-1432, 2011
Online since
May 2011
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$32.00
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