Paper Title:
Micropatterning of Schiff Bases Polymer Langmuir-Blodgett (LB) Films
  Abstract

A series of novel copolymers poly (AOBDA-co-DNMMA)s containing 2-Allyloxy-N-benzyl- idene dodecylamine (AOBDA) and 1.4-dioxaspiro[4.4] nonane-2-methyl methacrylate (DNMMA) were synthesized. The copolymers could form stable condensed monolayer at air/water interface and be transformed onto solid substrates successively. Positive-tone patterns with the resolution of 0.75 μm of the copolymers Langmuir-Blodgett (LB) films with 40 layers were obtained by deep UV irradiation, followed by developing in acetone. The etched gold patterns with resolution of 0.75 μm were also obtained, showing that the copolymer has enough resistance to wet etching suitable for fabricating photomask. The mechanism of photolysis was also investigated by UV, IR and GPC.

  Info
Periodical
Advanced Materials Research (Volumes 239-242)
Edited by
Zhong Cao, Xueqiang Cao, Lixian Sun, Yinghe He
Pages
1998-2001
DOI
10.4028/www.scientific.net/AMR.239-242.1998
Citation
T. S. Li, W. J. Xu, H. Y. Jia, Y. J. Wu, T. Miyashita, "Micropatterning of Schiff Bases Polymer Langmuir-Blodgett (LB) Films", Advanced Materials Research, Vols. 239-242, pp. 1998-2001, 2011
Online since
May 2011
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$32.00
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