Paper Title:
A Theoretical Analysis of the Fracture Behavior of a Multi-Layered Thin Film Structure under Residual Tensile Stress
  Abstract

In this work, the fracture behavior of a multi-layered thin film structure under residual tensile stress is investigated theoretically. Using composite material theory and a modified shear-lag model, the analytical solutions for the distribution laws of the tensile stress developed in the first-layer thin film and the shear stress developed along the interface can be obtained. In addition, the crack density of the first-layer thin film can be derived from the residual stress and the mechanical and geometric parameters of the cracked system. This result also yields a measurement of the residual stress from the crack density and the mechanical and geometric parameters of the system. Finally, a numerical example is presented to show how the crack density varies versus the residual stress.

  Info
Periodical
Advanced Materials Research (Volumes 239-242)
Edited by
Zhong Cao, Xueqiang Cao, Lixian Sun, Yinghe He
Pages
2179-2182
DOI
10.4028/www.scientific.net/AMR.239-242.2179
Citation
B. Q. Yang, F. X. Li, "A Theoretical Analysis of the Fracture Behavior of a Multi-Layered Thin Film Structure under Residual Tensile Stress", Advanced Materials Research, Vols. 239-242, pp. 2179-2182, 2011
Online since
May 2011
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