Paper Title:
Transparent Conductive Cu-In-O Thin Films Deposited by Reactive DC Magnetron Sputtering with Different Targets
  Abstract

Transparent conductive Cu-In-O thin films were deposited by reactive DC magnetron sputtering. Two types of targets were used. The first was In target covered with a fan-shaped Cu plate of the same radius and the second was Cu target on which six In grains of 1.5mm was placed with equal distance between each other. The samples were characterized with scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), UV/VIS spectrophotometer, four-probe measurement etc. SEM shows that the surfaces of all the samples are very smooth. EDX shows that the samples contain Cu, In as well as O, and different targets result in different atomic ratios of Cu to In. A diffraction peak related to rhombohedra-centered In2O3 (012) is observed in the XRD spectra of all the samples. For both the two targets, the transmittance decreases with the increase of O2 flow rates. The direct optical band gap of all the samples is also estimated according to the transmittance curve. For both the two targets, different O2 flow rates result in different sheet resistances and conductivities. The target of Cu on In shows more controllability in the composition and properties of Cu-In-O films.

  Info
Periodical
Advanced Materials Research (Volumes 239-242)
Edited by
Zhong Cao, Xueqiang Cao, Lixian Sun, Yinghe He
Pages
2752-2755
DOI
10.4028/www.scientific.net/AMR.239-242.2752
Citation
F. Ye, X. M. Cai, F. P. Dai, D. P. Zhang, P. Fan, L. J. Liu, "Transparent Conductive Cu-In-O Thin Films Deposited by Reactive DC Magnetron Sputtering with Different Targets", Advanced Materials Research, Vols. 239-242, pp. 2752-2755, 2011
Online since
May 2011
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$32.00
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