Paper Title:
Nanocrystalline Diamond Film Produced by Argon Addition in the CH4-H2 Microwave CVD Plasmas
  Abstract

Diamond coatings on pure titanium substrates are of interest for tribological and biomedical implants. However, due to the different thermal expansion coefficients of the two materials, the complex nature of the interlayer formed during diamond deposition, and the difficulty in achieving very high nucleation density, it is hard to deposit adherent thin diamond layers on titanium. The aim of the present research was to successfully produce smooth and well adherent nanocrystalline diamond (NCD) film on a pure Ti substrate using the microwave plasma chemical vapor deposition (MWPCVD) method. The influence of Argon addition to CH4/H2 plasma on the crystallinity, morphology and growth of the diamond film deposited by MWPCVD was investigated using field emission scanning electron microscopy (FE-SEM), atomic force microscopy (AFM), Xray diffraction (XRD) and Raman spectroscopy.

  Info
Periodical
Advanced Materials Research (Volumes 26-28)
Edited by
Young Won Chang, Nack J. Kim and Chong Soo Lee
Pages
615-618
DOI
10.4028/www.scientific.net/AMR.26-28.615
Citation
S. J. Askari, F. X. Lu, "Nanocrystalline Diamond Film Produced by Argon Addition in the CH4-H2 Microwave CVD Plasmas", Advanced Materials Research, Vols. 26-28, pp. 615-618, 2007
Online since
October 2007
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Price
$32.00
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