Nanocrystalline diamond (NCD) films on titanium alloys are of importance for tribology and biomedical implants. However, due to the different thermal expansion coefficients of the two materials, the complex nature of the interlayer formed during diamond deposition, and the difficulty in achieving high nucleation density, it is difficult to deposit adherent NCD films on titanium and its alloys. The aim of this research work is to successfully produce smooth, low roughness and well adherent NCD film on a pure Ti substrate by bias enhanced nucleation (BEN) process using microwave plasma chemical vapor deposition (MWPCVD) method. The friction coefficient was estimated to be around 0.06 in dry air using ball on disk tribometer with reciprocating sliding against a cemented carbide ball of 10 mm diameter at a high contact load of 20 N in dry air. The friction coefficient of bare Ti was between 0.55-06.