Paper Title:
Principle and Experiment of Ultrasonic Subtle Atomization in CMP
  Abstract

The method of chemical mechanical polishing (CMP) using slurry which was ultrasonic subtle atomized was researched, and the system of Ultrasonic Subtle Atomization—Chemical Mechanical Polishing was established. The effects of polish parameters on polishing were also investigated. The results show that the experimental system can fully realize the expected function of polishing, the use of slurry is about one-tenth of the amount of traditional CMP, material removal rate can reach 113.734nm/min and the surface roughness is similar to the surface roughness in the traditional way.

  Info
Periodical
Chapter
II. Solid Mechanics
Edited by
Fei Hu and Beibei Wang
Pages
287-290
DOI
10.4028/www.scientific.net/AMR.279.287
Citation
X. P. Liu, X. C. Chen, Q. Z. Li, "Principle and Experiment of Ultrasonic Subtle Atomization in CMP", Advanced Materials Research, Vol. 279, pp. 287-290, 2011
Online since
July 2011
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Price
$32.00
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