Paper Title:
Gas Barrier Properties of SiOX Films Deposited by RF Magnetron Co-Sputtering
  Abstract

SiOx barrier films were deposited on poly (ethylene terephthalate) (PET) by radio frequency (RF) magnetron co-sputtering with double targets. The films deposited by co-sputtering were denser and smoother because different energy particles sputtering from double targets grew small islands to weaken shadowing effect which greatly reduce the interval gaps. The water vapor and oxygen transmission of SiOx films deposited by co-sputtering decreased to 0.31 cc/m2/day, 0.27 g/m2/24h respectively.

  Info
Periodical
Advanced Materials Research (Volumes 284-286)
Chapter
Composites
Edited by
Xiaoming Sang, Pengcheng Wang, Liqun Ai, Yungang Li and Jinglong Bu
Pages
48-52
DOI
10.4028/www.scientific.net/AMR.284-286.48
Citation
Z. Liu, L. Zhu, J. Lin, Z. H. Sun, "Gas Barrier Properties of SiOX Films Deposited by RF Magnetron Co-Sputtering", Advanced Materials Research, Vols. 284-286, pp. 48-52, 2011
Online since
July 2011
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Price
$32.00
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