Paper Title:
Characterization of Ti-Al-N Films Deposited by Cathodic Vacuum Arc with Different N2 Partial Pressure
  Abstract

A series of Ti-Al-N films were deposited on silicon wafer and steel substrates by cathodic vacuum arc technique in N2/Ar gas mixtures, using a compound Ti(50):Al(50) target. The chemical composition, crystalline microstructure, film deposition rate and surface morphology of the films were investigated by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscope (SEM) coupled with an energy dispersive X-ray analysis system (EDX), respectively. The hardness and Young’s modulus, wear performance and corrosion behavior of the Ti-Al-N (multi-phase) films at different N2 partial pressure were analyzed and explained on the basis of microstructure, mechanical properties and wear mechanisms.

  Info
Periodical
Advanced Materials Research (Volumes 287-290)
Chapter
Thin Films
Edited by
Jinglong Bu, Pengcheng Wang, Liqun Ai, Xiaoming Sang, Yungang Li
Pages
2429-2433
DOI
10.4028/www.scientific.net/AMR.287-290.2429
Citation
G.P. Zhang, X.Q. Wang, G.H. Lv, H. Chen, H. Pang, L. Zhou, J. Huang, W. Chen, S.Z. Yang, "Characterization of Ti-Al-N Films Deposited by Cathodic Vacuum Arc with Different N2 Partial Pressure", Advanced Materials Research, Vols. 287-290, pp. 2429-2433, 2011
Online since
July 2011
Export
Price
$32.00
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