Paper Title:
Research of GaAs Polishing Uniformity on Non-Abrasive Cryogenic Conditions
  Abstract

In the paper, it is introduced a new method of non-abrasive cryogenic polishing which is used to polish GaAs chips. It is also analyzed the influence of different factors on polishing surfaces and polishing uniformity. The rotate speed of work piece disk is a more important factor on impacting the polishing uniformity than offset e.

  Info
Periodical
Advanced Materials Research (Volumes 291-294)
Chapter
Surface Engineering/Coatings
Edited by
Yungang Li, Pengcheng Wang, Liqun Ai, Xiaoming Sang and Jinglong Bu
Pages
150-154
DOI
10.4028/www.scientific.net/AMR.291-294.150
Citation
S. P. Qu, T. Z. Liang, Z. S. Zhang, "Research of GaAs Polishing Uniformity on Non-Abrasive Cryogenic Conditions", Advanced Materials Research, Vols. 291-294, pp. 150-154, 2011
Online since
July 2011
Export
Price
$32.00
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