Paper Title:
Effects of Substrate Bias Voltage on the Critical Failure Load of Cr-Al-N Coatings
  Abstract

Cr-Al-N coatings with the thickness of about 2 mm have been prepared in a magnetron sputtering system by reactive co-sputtering from a chromium target and an aluminum target in a mixed Ar/N2 atmosphere. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated by a scratch test as the VB varied from 0 to –150 V. The critical failure load reached the maximum value for the coating deposited under VB = –50 V, then decreased with VB further increasing. Re-sputter effect of The heavy bombardment of the ion to the substrate improve the critical failure load for the coating deposited under VB = –50 V. The decrease of the critical failure loads for the coatings deposited under –100V and –150 V probably resulted from the high microstrain in the crystal lattice.

  Info
Periodical
Advanced Materials Research (Volumes 291-294)
Chapter
Surface Engineering/Coatings
Edited by
Yungang Li, Pengcheng Wang, Liqun Ai, Xiaoming Sang and Jinglong Bu
Pages
180-183
DOI
10.4028/www.scientific.net/AMR.291-294.180
Citation
S. W. Duo, M. Zhu, J. M. Ge, X. M. He, L. Meng, "Effects of Substrate Bias Voltage on the Critical Failure Load of Cr-Al-N Coatings", Advanced Materials Research, Vols. 291-294, pp. 180-183, 2011
Online since
July 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Ming Zhu, Mei Shuan Li
Abstract:Cr-Al-N coatings were deposited on the surface of the (111) single silicon for the aim to study the thermal stability of this kind of...
249
Authors: Nirun Witit-Anun, Amphol Teekhaboot
Chapter 3: Coating and Thin Film
Abstract:Titanium chromium nitride (TiCrN) thin films were deposited by reactive DC magnetron co-sputtering. The effect of Ti sputtering current...
181
Authors: Adisorn Buranawong, Nirun Witit-Anun
Chapter 2: Nanomaterials, Chemistry and Biochemistry of Materials, Chemical Technologies
Abstract:The CrN thin films were deposited on silicon (100) substrate using reactive magnetron sputtering technique. The films were characterized by...
57