Paper Title:
Reducing Surface Defects of CrXOY Film in Mid-Frequency Dual-Magnetron Sputtering
  Abstract

Influence of the process parameters of a reactive mid-frequency dual-magnetron sputtering on surface defects of CrxOy film was investigated. The forming mechanisms of the observed droplets and craters were analyzed. The optimal parameter combination for accomplishing fewer surface defects was explored; and the optimized process parameters evidently minimized the surface defects of the film. In the condition of the target current of 16 A, the gases pressure of 0.31 Pa, and the bias voltages in a range of -120~-240 V, an optimized CrxOy film has been synthesized with surface defect density low to 78 defect/mm-2.

  Info
Periodical
Advanced Materials Research (Volumes 291-294)
Chapter
Surface Engineering/Coatings
Edited by
Yungang Li, Pengcheng Wang, Liqun Ai, Xiaoming Sang and Jinglong Bu
Pages
219-222
DOI
10.4028/www.scientific.net/AMR.291-294.219
Citation
X. Yu, L. Ma, Y. Liu, Z. Z. Yang, H. Meng, "Reducing Surface Defects of CrXOY Film in Mid-Frequency Dual-Magnetron Sputtering", Advanced Materials Research, Vols. 291-294, pp. 219-222, 2011
Online since
July 2011
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Price
$32.00
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