Paper Title:
Preparation and Processing of PZT Thin Film by Liquid Mist Microwave Plasma Enhanced Chemical Vapour Deposition
  Abstract

PZT thin film was prepared on platinized Si substrates by liquid-source mist microwave plasma enhanced chemical vapour deposition. Using citric amine and ethylene glycol as chelating agent, a homogeneous, stable water solvent sol was prepared successfully, which was suitable to develop PZT thin film by LSMPECVD. From the analysis of FTIR spectra, the special functions of chelating agents were identified. It shows that this deposition process is nonuniform nucleation, the PZT thin film grew with island model. Prior to fill the blank sites on the substrate, the latter deposited PZT congregated together to reduce surface energy. The morphology and structure were characterized by SEM and XRD analysis.

  Info
Periodical
Advanced Materials Research (Volumes 295-297)
Chapter
Chapter 3: Forming and Shaping Processes and Equipment
Edited by
Pengcheng Wang, Liqun Ai, Yungang Li, Xiaoming Sang and Jinglong Bu
Pages
1747-1750
DOI
10.4028/www.scientific.net/AMR.295-297.1747
Citation
J. J. Hao, Y. Y. Li, H. M. Ji, "Preparation and Processing of PZT Thin Film by Liquid Mist Microwave Plasma Enhanced Chemical Vapour Deposition", Advanced Materials Research, Vols. 295-297, pp. 1747-1750, 2011
Online since
July 2011
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Price
$32.00
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