Paper Title:
Growth and Field Emission Properties of the Carbon Complex Films
  Abstract

The carbon complex film, Which consists of diamond grains, carbon nanotubes, amorphous carbon composition, were fabricated by microwave plasma chemical vapor deposition (MPCVD) method. The ceramic with a Ti mental layer was used as substrate. The carbon complex films were evaluated by Raman scattering spectroscopy, x-ray diffraction spectrum, scanning electron microscope. The field emission properties were tested by using a diode structure in a vacuum. A phosphor-coated indium tin oxide anode was used for observing and characterizing the field emission. The turn-on field was only 0.55V/μm and emission current density as high as 11mA/cm2 was obtained under an applied field of 2.18V/μm for the first operation. The growth mechanism and field emission properties of the carbon complex films are discussed relating to microstructure and electrical conductivity.

  Info
Periodical
Advanced Materials Research (Volumes 295-297)
Chapter
Chapter 6: Surface Technology
Edited by
Pengcheng Wang, Liqun Ai, Yungang Li, Xiaoming Sang and Jinglong Bu
Pages
1969-1971
DOI
10.4028/www.scientific.net/AMR.295-297.1969
Citation
J. H. Gao, Z. Li, W. Q. Zhang, "Growth and Field Emission Properties of the Carbon Complex Films", Advanced Materials Research, Vols. 295-297, pp. 1969-1971, 2011
Online since
July 2011
Export
Price
$32.00
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