Paper Title:
Effect of Post-Annealing Ambient on Electrical Structural Properties and Optical Properties of ZnO:Al Transparent Films
  Abstract

Transparent ZnO:Al films deposited by RF/DC magnetron sputtering in room temperature are annealed under gaseous ammonia ambient and air ambient, respectively. The characteristics of ZnO films are examined by XRD, SEM, Hall measurement and optical transmission spectra. The XRD and SEM analysis shows that both films are crystallized in the wurzite phase with a preferential orientation along the c-axis and have a smooth dense surface. Hall measurement results indicate ZnO:Al films annealed under ammonia ambient convert to p-type conduction with the high carrier concentration of 8.3×1018 cm-3. Optical transmission spectra show a high transmittance (~85%) in the visible region.

  Info
Periodical
Advanced Materials Research (Volumes 299-300)
Edited by
Jianzhong Wang and Jingang Qi
Pages
675-678
DOI
10.4028/www.scientific.net/AMR.299-300.675
Citation
L. D. Tang, B. Wang, J. Z. Wang, "Effect of Post-Annealing Ambient on Electrical Structural Properties and Optical Properties of ZnO:Al Transparent Films", Advanced Materials Research, Vols. 299-300, pp. 675-678, 2011
Online since
July 2011
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Price
$32.00
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