Interferogram processing is one of main techniques in optical interferometry metrology. Modern interferometry for thin-film thickness has the advantages of noncontact and high accuracy, etc. Interferogram processing is important Step of interferometry. This article is the sum-up about the key technology of interferogram processing in interferometry, it reduce key technology of interferogram processing to three steps: removing the noise, edge detection, region spreading and phase unwrapping. Interferogram processing can be realized by using software developed by the key technologies. Then getting surface of the measured material object, thus the measured material object is measured automatically. In this paper, the thin-film thickness is determined by the key technologies, setting the results of this method against results from ZYGO, the PV error and RMS maximum error are 0.0364λ and 0.002λ respectively. Although single interferogram was processed in this study, a phase distribution with high accuracy was achieved.