Paper Title:
Preparation and Characteristics of Nanocrystalline Diamond Film by Using of MPVCD
  Abstract

With the microwave plasma chemical vapor deposition (MPCVD), the effects of the deposition pressure and the different substrate temperature on diamond coating on single crystal silicon substrate were studied systemically. The sample was characterized by means of scanning electron microscopy (SEM) and laser Raman spectra (Raman). The experimental results showed that the surface of the film was compact, the mean particle diameter was 98nm, and that it contains the sp3 carbon phase with good quality.

  Info
Periodical
Edited by
Jerry Tian
Pages
1-5
DOI
10.4028/www.scientific.net/AMR.304.1
Citation
B. H. Yang, H. L. Ma, H. Y. Lu, X. B. Zhang, "Preparation and Characteristics of Nanocrystalline Diamond Film by Using of MPVCD", Advanced Materials Research, Vol. 304, pp. 1-5, 2011
Online since
July 2011
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