Paper Title:
Influence of Treatment of Hydrogen Plasma on Field Emission Properties of Carbon Nanotubes Films
  Abstract

Carbon nanotubes(CNTs) films were fabricated by microwave plasma chemical vapor deposition (MPCVD) on stainless steel substrates. In order to study the reason that its emission current weakens, the CNTs films were treated by hydrogen plasma. The research discovered that the hydrogen plasma treatment to the carbon nanotubes films reduced the surface work function of the film and its filed emission current, this mainly due to the etching of hydrogen plasma to sp2 carbon on the surface, it leads emission area to decrease.

  Info
Periodical
Advanced Materials Research (Volumes 306-307)
Chapter
Chapter 9: Nano Materials
Edited by
Shiquan Liu and Min Zuo
Pages
1170-1173
DOI
10.4028/www.scientific.net/AMR.306-307.1170
Citation
Z. Q. Fan, H. F. Ou, R. Li, G. W. Cai, J. D. Zhang, "Influence of Treatment of Hydrogen Plasma on Field Emission Properties of Carbon Nanotubes Films", Advanced Materials Research, Vols. 306-307, pp. 1170-1173, 2011
Online since
August 2011
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Price
$32.00
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