Paper Title:
Influence of Annealing Temperature on the Structure and Electrochromic Properties of NiOx Thin Films
  Abstract

The NiOx thin flims deposited on SnO2/glass substrates by RF sputtering were investigated through XRD、SEM、spectrophotometer and Cyclic voltammetry. The relationship between electrochromic properties and micro-structure of NiOx was also studied. Results show that NiOx films prepared by sputtering are preferred to grow along (200) direction; the crystallize size of NiOx films increases and the transmittance of colored and bleached states of NiOx films also increases with annealing temperature rising, but the transmittance different between bleached and coloured states reduces. The declined electrochromic propertiey of NiOx with the increase of annealing temperature is also found.

  Info
Periodical
Advanced Materials Research (Volumes 306-307)
Chapter
Chapter 3: Optical and Electronic Materials
Edited by
Shiquan Liu and Min Zuo
Pages
372-377
DOI
10.4028/www.scientific.net/AMR.306-307.372
Citation
G. Y. Yan, X. Zhang, P. Huang, H. R. Liu, B. X. Feng, "Influence of Annealing Temperature on the Structure and Electrochromic Properties of NiOx Thin Films", Advanced Materials Research, Vols. 306-307, pp. 372-377, 2011
Online since
August 2011
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$32.00
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