nanoimprint was developed quickly in decades because of its ultrahigh resolution, low cost, high throughput. It has demonstrated the ability to pattern 5 nm line-width and 12 inch wafer, and is one of the support technology in NGL. This paper reported a novel nanoimprint to improve the pressure uniformity with air cushion press. The chamber is sealed by a SiO2 window with an elastic ring membrane, on which the mold is fixed . Ultraviolet light solidify resist on the wafer through this window. When air in chamber bleeded the window falled and the mold is pressed into the resist. If air leading into the chamber again, the mold separate from substrate by the elastic ring membrane, then the patterns on mold are translated onto the substrate. Experiments exhibit that this nanoimprint system can replicate features with high fidelity over a large patterning area.