Paper Title:
Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator
  Abstract

In this paper, the effect of resident stress on surface flatness and aberration correction ability of spatial light modulator (SLM) is studied. An optical simulation model based on ZEMAX software is presented to calculate the Strehl ratio of SLM. The result shows that the decrease of curvature radius can result in the decrease of Strehl ratio and aberration correction ability. Moreover, resident tensile stress and resident compressive stress have the same effect on the change of Strehl ratio.

  Info
Periodical
Advanced Materials Research (Volumes 317-319)
Chapter
NEMS/MEMS Technology and Equipment
Edited by
Xin Chen
Pages
1677-1680
DOI
10.4028/www.scientific.net/AMR.317-319.1677
Citation
F. R. Hu, Y. X. Qian, J. H. Niu, L. J. Zhang, K. Nie, "Effect of Resident Stress on the Aberration Correction Ability of MEMS Spatial Light Modulator", Advanced Materials Research, Vols. 317-319, pp. 1677-1680, 2011
Online since
August 2011
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Price
$32.00
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