Paper Title:
Topology Optimization with a Penalty Factor in Optimality Criteria
  Abstract

Topology optimization is one of the most important methods of reducing the weight of structure. Optimality Criteria method (OC) as a heuristic way can be used to deal with this problem efficiently. Popular SIMP method implements micro-structural density as the design variable. During the process of optimization, numerical instabilities are always observed; Moreover, higher penalty factor is not better for decreasing intermediate density elements. In this paper a penalty factor is imposed in OC method, and a relation between the filtering area and elements is also obtained. Meanwhile, the nodal density is used as design variable for more smoothing boundary. The results show that numerical stability can be obtained, checkerboard patterns haven’t been observed, and the clear boundary of structure has been developed.

  Info
Periodical
Advanced Materials Research (Volumes 317-319)
Chapter
Construction Machinery and Equipment
Edited by
Xin Chen
Pages
2466-2472
DOI
10.4028/www.scientific.net/AMR.317-319.2466
Citation
X. P. Wang, S. W. Yao, "Topology Optimization with a Penalty Factor in Optimality Criteria", Advanced Materials Research, Vols. 317-319, pp. 2466-2472, 2011
Online since
August 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Khiam Aik Khor, Yong Wan Gu, P. Cheang, F.Y.C. Boey
497
Authors: Bożena Bierska-Piech, Dariusz Chocyk, Adam Prószyński, Eugeniusz Łągiewka
Abstract:The X-ray reflectometry (XR), as a non-destructive method, is a powerful tool in obtaining information about parameters of thin films such...
80
Authors: Jian Li, Bin Ting Yang
Abstract:Utilization of finite element method (FEM) and warm compaction process, study on mechanical theory and FEM simulation of molybdenum powder...
119
Authors: Jun Jing Yang, Hong Yan Chu, Li Gang Cai, Lei Su
Chapter 18: Quality Monitoring and Control of the Manufacturing Process
Abstract:Abstract : Aiming at the controlled object with large lag, model uncertainty and time variation due to the effects of working environment in...
3071
Authors: Yuan Xiang Zhang, Jun Wu, Ying Yu Ji
Abstract:This paper investigates the electromigration (EM) induced void and hillock generation in IC interconnect structures. The driving force for...
6