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The Role of Al2O3 Buffer Layer in the Growth of Aligned CNTs

Journal Advanced Materials Research (Volume 32)
Volume Frontiers in Materials Science and Technology
Edited by John Bell, Cheng Yan, Lin Ye and Liangchi Zhang
Pages 29-32
DOI 10.4028/www.scientific.net/AMR.32.29
Citation M.K. Lai et al., 2008, Advanced Materials Research, 32, 29
Online since February, 2008
Authors M.K. Lai, Norani Muti Mohamed, K.M. Begam
Keywords Al2O3 Buffer Layer, Aligned MWNT`s, Chemical Vapour Deposition (CVD), Electron Beam Evaporation
Abstract

Carbon nanotube (CNT) can be thought of as a hexagonal network of carbon atoms that has been rolled up to make a seamless cylinder. If they are consisting of one layer, they are termed singled-walled CNTs (SWNTs) while if there are multiple walls, they are called multi-walled CNTs (MWNTs). For most functional devices application, an aligned arrangement of CNTs is desired. Aligned multiwalled carbon nanotubes (MWNTs) have been successfully grown by the inclusion of a buffer layer of oxidized Al. An Al2O3 layer has been proven to be an important contributing factor towards obtaining good quality aligned CNTs. In this work, Al is deposited onto the Si wafer using electron beam evaporation and later oxidized by heating in air. A thin layer of iron catalyst is then deposited on top of the oxidized Al layer and annealed at 400oC. The result shows an improvement in the intensity of the graphitization peak (G-band) in the Raman spectra and aligned MWNTs is observed in these samples compared to the ones that have undergone the same process parameter except the Al2O3 layer.

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