Paper Title:
Influence of Magnetron Effect on Barium Hexaferrite Thin Layers
  Abstract

In this paper, we study the effects of a magnet, located in the cathode, on barium hexaferrite thin films deposited by RF magnetron sputtering technique. During the process, these effects can modify thickness, roughness and stress of coatings. The characteristics of the deposited layers depend on the substrate position that is located opposite of magnetron cathode. In the "magnetron area", one can observe that the high stress can produce cracks or detachment of layers and the increasing of both depositing rate and surface roughness. After sputtering elaboration, barium hexaferrite films are in a compressive stress mode. But, after the post-deposition heat treatment these films are in a tensile stress mode. To improve the quality of BaM films, the subsrtate has to be set outside the magnetron area.

  Info
Periodical
Chapter
Chapter I: Materials and Elaboration Techniques
Edited by
Maher Soueidan, Mohamad Roumié and Pierre Masri
Pages
97-100
DOI
10.4028/www.scientific.net/AMR.324.97
Citation
H. Hassane, J. P. Chatelon, J. J. Rousseau, A. Siblini, A. Kriga, "Influence of Magnetron Effect on Barium Hexaferrite Thin Layers", Advanced Materials Research, Vol. 324, pp. 97-100, 2011
Online since
August 2011
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Price
$32.00
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