Paper Title:
An Investigation on the Chemical Effect in Chemo-Mechanical Polishing
  Abstract

This paper develops a statistical model to analyze the chemical effect on the material removal rate (MRR) in chemo-mechanical polishing of material surfaces (MS). It was considered that the chemical effect comes into play through a passivated layer on the MS. It was found that the effect of such layer on MRR depends on the mean particle radius, the elastic modulus of the pad, and the hardnesses of the passivated layer and the workpiece material.

  Info
Periodical
Chapter
Chapter 3: Polishing and Lapping
Edited by
Taghi Tawakoli
Pages
451-456
DOI
10.4028/www.scientific.net/AMR.325.451
Citation
X.L. Jin, L. C. Zhang, "An Investigation on the Chemical Effect in Chemo-Mechanical Polishing", Advanced Materials Research, Vol. 325, pp. 451-456, 2011
Online since
August 2011
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Price
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