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Evaluation of Surface Roughness of Quartz Glass Substrate in Fabrication Process for Neutron Focusing Mirror

Journal Advanced Materials Research (Volume 325)
Volume Advances in Abrasive Technology XIV
Edited by Taghi Tawakoli
Pages 647-652
DOI 10.4028/www.scientific.net/AMR.325.647
Citation Mikinori Nagano et al., 2011, Advanced Materials Research, 325, 647
Online since August, 2011
Authors Mikinori Nagano, Fumiya Yamaga, Kenta Yamasaki, Nobuyuki Zettsu, Dai Yamazaki, Ryuji Maruyama, Kazuhiko Soyama, Kazuya Yamamura
Keywords Aspherical, CeO2, Etching, Focusing, HF, Low Pressure Polishing, Neutron, Numerically Control, Quartz Glass, Roughness, Supermirror
Abstract

The aspherical supermirror is among the most useful optics for focusing a neutron beam with a wide wavelength range. The improvement in surface roughness is essential for increasing the focusing gain. A highly efficient and high-precision fabrication process for the substrate of the aspherical mirror combining conventional precision grinding, numerically controlled local wet etching (NC-LWE) figuring, and low-pressure polishing was developed. Using this new fabrication process, plano-elliptical neutron-focusing mirror substrates were successfully fabricated with a figure error of submicrometer order and an rms surface roughness of less than 0.3 nm. In this report, the surface roughness of a quartz glass substrate for a neutron focusing supermirror was evaluated.

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