Paper Title:
Effects of N-Doped Quantity and Current Density on Properties of TiO2 Films by Arc Ion Plating
  Abstract

TiO2 thin films of different N-doped quantity and different current density were deposited on medical glass slide by arc ion plating. Film structure, surface morphology and optical properties were measured with XRD, SEM and UV-VIS transmittance spectroscope. Photo-catalytic performance of the films was evaluated by degradation methyl orange. The current density, O2 partial pressure and N2 partial pressure were varied in order to determine their effect on the properties of TiO2 films. The study got the best doped process (current 50A,O2 50sccm, N2 250 sccm, Ar 20sccm). In these experimental conditions, the absorption edge successfully moved to 510nm, the as-deposited TiO2 films structure was composed with anatase and rutile. The annealing treatment made the crystal microscopy more obviously. The N-doped TiO2 film not only reduced the UV catalytic performance , but also extended the catalytic properties to the sun light.

  Info
Periodical
Chapter
Chapter 1: Smart Materials and Nanotechnology
Edited by
J.L. Zhong
Pages
87-92
DOI
10.4028/www.scientific.net/AMR.345.87
Citation
S. J. Zhang, M. S. Li, Z. Q. Chen, J. X. Hu, "Effects of N-Doped Quantity and Current Density on Properties of TiO2 Films by Arc Ion Plating", Advanced Materials Research, Vol. 345, pp. 87-92, 2012
Online since
September 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Li Na Li, Jing Hua Gu, Yue Zhang
Abstract:MOCVD was applied to deposit TiO2 thin films on glass substrates. Effects of the deposition conditions (source temperature and substrate...
1976
Authors: Gaurav Shukla, Alika K. Khare
Abstract:TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors,...
65
Authors: Chia Cheng Huang, Fang Hsing Wang, Cheng Fu Yang, Hong Hsin Huang, Cheng Yi Chen, Ping Chih Huang
Abstract:W-TiO2 (W, tungsten) dual-layer thin films are deposited by RF magnetron sputtering onto glass substrates and annealed at 150oC~400oC for...
506
Authors: Feng Zhou, Ying Qing Fu, Kai Ming Liang
Abstract:The crystallization behavior and microstructure of Li+-doped TiO2 thin films prepared by sol-gel dip coating were investigated by means of...
750
Authors: Weerachai Sangchay, Lek Sikong, Kalayanee Kooptarnond, Xin Wei
Abstract:TiO2-AgCl/Cu2+ thin films containing 0 to 1%Cu2+ coated on glass slides were prepared by sol gel-dip coating method. The prepared films were...
149