Paper Title:
Effect of Hydrogen on the Properties of Amorphous Carbon Nitride Films
  Abstract

The effect of hydrogen on the properties of amorphous carbon nitride films deposited onto Si substrates by magnetron sputtering device has been studied. The influence of hydrogen to roughness, porous character of films, composition and residual stress was investigated by atomic force microscopy, thermal desorption mass spectroscopy, X-ray photoelectron spectroscopy, scanning low energy electron microscopy and by goniometer equipped with Cu X-ray tube. The adding of hydrogen to nitrogen discharge a causes decrease in the high value of compressive stress (elimination of delamination of the films, increasing of nitrogen content in the bulk). On the other hand hydrogen increases roughness and porosity.

  Info
Periodical
Advanced Materials Research (Volumes 383-390)
Chapter
Chapter 11: Materials Behavior
Edited by
Wu Fan
Pages
3298-3304
DOI
10.4028/www.scientific.net/AMR.383-390.3298
Citation
E. Mikmeková, M. Urbánek, T. Fořt, R. Di Mundo, O. Caha, "Effect of Hydrogen on the Properties of Amorphous Carbon Nitride Films", Advanced Materials Research, Vols. 383-390, pp. 3298-3304, 2012
Online since
November 2011
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Price
$32.00
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