Paper Title:

Effect of Substrate Temperature on High Rate Deposited ZnO:Al Films by Magnetron Sputtering

Periodical Advanced Materials Research (Volumes 430 - 432)
Main Theme Frontiers of Advanced Materials and Engineering Technology
Chapter Chapter 1: Advanced Materials Science
Edited by Ran Chen, Dongye Sun and Wen-Pei Sung
Pages 480-483
DOI 10.4028/www.scientific.net/AMR.430-432.480
Citation Wei Min Li et al., 2012, Advanced Materials Research, 430-432, 480
Online since January, 2012
Authors Wei Min Li, Hui Ying Hao
Keywords AZO Film, High Rate, Magnetron Sputtering, Substrate Temperature
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A series of ZnO:Al (AZO) thin films was prepared on quartz at different substrate temperature using magnetron sputtering with high deposited rate of 67 nm/min. The structural, electrical and optical properties of these films were investigated as a function of substrate deposition temperature ranging from room temperature to 500 °C. The surface micrograph of AZO film deposited at room temperature was measured by a scanning electron microscope (SEM) and an atomic force microscope (AFM). The results of X-ray diffraction (XRD) test show that all the films have a (002) preferential orientation. The best electrical property was obtained at 500 °C, the resistivity was 9.044×10-4 ohm•cm, and the corresponding carrier concentration and mobility were 3.379×1020 /cm3 and 20.45 m2/Ns, respectively. What's more, all the films show a high optical transmittance.

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