Paper Title:
Effect of the Y2O3 Addition Content on the Structural Properties of ZrO2 Thin Films and Coating Material
  Abstract

The influence of addition of Y2O3 on the structure of ZrO2 thin films and bulk material was studied employing X-ray diffraction (XRD) analysis. The films were prepared by the electron-beam evaporation method. XRD analysis permits the study of the stabilization process. For pure ZrO2 thin film and coating material, the crystallographic structure is monoclinic phase; with increasing Y2O3 mole percent, the structure of Y2O3 stabilized ZrO2 (YSZ) material changes from a mixture of monoclinic and cubic phase to a single cubic phase. Furthermore, calculated results of grain size show that YSZ thin film and coating material have the same crystallization trend.

  Info
Periodical
Advanced Materials Research (Volumes 443-444)
Chapter
Chapter 2: Optical, Electronic Materials and Industrial Application
Edited by
Li Jian
Pages
655-659
DOI
10.4028/www.scientific.net/AMR.443-444.655
Citation
S. G. Wu, H. Y. Zhang, J. D. Shao, Z. X. Fan, "Effect of the Y2O3 Addition Content on the Structural Properties of ZrO2 Thin Films and Coating Material", Advanced Materials Research, Vols. 443-444, pp. 655-659, 2012
Online since
January 2012
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Price
$32.00
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