Paper Title:
Influence of Hydrogen-Plasma Treatment on Blood Compatibility of Titanium Oxide Films
  Abstract

Non-stoichiometric titanium dioxide (TiO2-x) thin films were obtained by unbalanced reactive pulsed magnetron sputtering and subsequently modified by hydrogen plasma. To investigate the influence of hydrogen plasma on the properties of the films, time and temperature were changed during the process with a fixed vacuum pressure of 10 Pa. The film structure, composition, resistance and blood compatibility were studied. The results that the concentration of Ti4+ decreases with the increasing of treated time and substrate temperature, which results in existence of oxygen vacancy and increase of conductivity. It is found that Ti-O film treated in 110°C plasma for 15min represents the lowest thrombosis risks, which could be mainly attributed to its characteristic of n-type semiconductor caused by appropriate oxygen vacancy forming in hydrogen plasma treatment.

  Info
Periodical
Advanced Materials Research (Volumes 47-50)
Edited by
Alan K.T. Lau, J. Lu, Vijay K. Varadan, F.K. Chang, J.P. Tu and P.M. Lam
Pages
1430-1433
DOI
10.4028/www.scientific.net/AMR.47-50.1430
Citation
Z. H. Yang, Y. Xu, P. Yang, Y. X. Leng, N. Huang, "Influence of Hydrogen-Plasma Treatment on Blood Compatibility of Titanium Oxide Films", Advanced Materials Research, Vols. 47-50, pp. 1430-1433, 2008
Online since
June 2008
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Price
$32.00
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