Paper Title:
Preparation of Silica Nano-Rods by CVD
  Abstract

The straight silica nano-rods with a diameter of about 200nm and smooth surface were synthesized by chemical vapor deposition method at 1300°C. The as-synthesized samples were characterized by means of scanning electron microscopy, energy dispersive x-ray, and transmission electron microscopy. The results show that as-synthesized silica nano-rods have a uniform size, well-defined shape, and smooth surface. However, the morphologies and microstructures of silica nano-rods are affected by synthesis conditions, such as the concentration of the SiOx and the the deposition temperature. On the basis of these experimental results, a possible growth mechanism of silica nano-rods in this process is proposed.

  Info
Periodical
Advanced Materials Research (Volumes 47-50)
Edited by
Alan K.T. Lau, J. Lu, Vijay K. Varadan, F.K. Chang, J.P. Tu and P.M. Lam
Pages
359-362
DOI
10.4028/www.scientific.net/AMR.47-50.359
Citation
G. Zhu, X. P. Zou, J. Cheng, M. F. Wang, Y. Su, "Preparation of Silica Nano-Rods by CVD", Advanced Materials Research, Vols. 47-50, pp. 359-362, 2008
Online since
June 2008
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Price
$32.00
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