Kinetics Study of Aluminum Deposition on Inner Wall of Pipes by Atomic Layer Deposition
| Periodical | Advanced Materials Research (Volumes 482 - 484) |
|---|---|
| Main Theme | Advanced Composite Materials |
| Edited by | Wenzhe Chen, Xingjun Liu, Pinqiang Dai, Yonglu Chen and Zhengyi Jiang |
| Pages | 627-632 |
| DOI | 10.4028/www.scientific.net/AMR.482-484.627 |
| Citation | Heng Liu et al., 2012, Advanced Materials Research, 482-484, 627 |
| Online since | February, 2012 |
| Authors | Heng Liu, Yu Qing Xiong, Ji Zhou Wang |
| Keywords | Aluminum, Atomic Layer Deposition, Inner Wall, Pipe, Waveguide |
| Price | US$ 28,- |
In this paper, feasibility of aluminium deposition on inner wall of pipes by atomic layer deposition was studied. Firstly, by solving kinetics equation of gas adsorption on the pipe inner wall, the time for the reactant to reach saturated adsorption on the wall was calculated. Secondly, according to the aluminium crystal structure, the thickness of each deposition cycle was obtained. Finally, the minimum aluminium thickness and number of atomic layer deposition cycles that can meet electromagnetic requirement of wave guide was calculated.