Paper Title:

Pulsed LASER Deposition of MgO Thin Films

Periodical Advanced Materials Research (Volume 545)
Main Theme Advancement of Materials and Nanotechnology II
Edited by Norlida Kamarulzaman
Pages 38-42
DOI 10.4028/www.scientific.net/AMR.545.38
Citation Norlida Kamarulzaman et al., 2012, Advanced Materials Research, 545, 38
Online since July, 2012
Authors Norlida Kamarulzaman, Nurhanna Badar
Keywords Bandgap, MgO, PLD, Thin Film
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Abstract

MgO thin films were deposited by Pulsed Laser deposition using different process parameter. The characteristics were investigated via X-Ray diffraction (XRD), Scanning Electron Microscope (SEM) and Digital Holographic Microscope (DHM). It is found that the thin film surface morphology and thickness are different. It was found that the different process parameters such as chamber gas pressure, substrate temperature, LASER energy and number of pulses greatly influence the characteristics of the thin films obtained. The thin films have very low thicknesses of 97, 187 and 193 nm.